All glass and Teflon ware, as well as all noble metal wires were stored in a solution of NOCHROMIX® (Sigma Aldrich) in concentrated sulfuric acid (Merck, Emsure, 98 %) overnight. Afterwards, we rinsed the equipment 5 times with ultra‐pure water (MilliQ Synergy UV, 18.2 MΩ cm at 25 °C, TOC <5 ppb) and boiled it 3 times in ultra‐pure water for 30 min. Finally, we dried the equipment overnight in an evacuated desiccator.
Nochromix
Manufactured by Merck Group
NOCHROMIX is a laboratory cleaning solution used for the removal of organic matter from glassware and other laboratory equipment. It is a non-chromic, non-acidic, and oxidizing solution that effectively cleans and decontaminates laboratory surfaces.
Automatically generated - may contain errors
Lab products found in correlation
Sulfuric acid, by Thermo Fisher Scientific (2 mentions)
Calcium chloride dihydrate, by Merck Group (1 mentions)
Concentratedsulfuric acid, by Carl Roth (1 mentions)
Alconox detergent solution, by Merck Group (1 mentions)
Sodium dodecyl sulfate (sds), by Merck Group (1 mentions)
Milli q academic unit, by Merck Group (1 mentions)
Erythrosine b, by Merck Group (1 mentions)
Milli q water, by Merck Group (1 mentions)
7 protocols using nochromix
1
Cleaning and Decontamination of Lab Equipment
2
Preparation and Characterization of NaPSS-CaCl2 Mixtures
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All glassware was cleaned with Alconox
detergent solution (Sigma-Aldrich) and ultrapure water (18.2 MΩ
cm, total oxidizable carbon <5 ppb) and stored in concentrated
sulfuric acid (98% p.a., Carl Roth) with oxidizer NOCHROMIX (Sigma-Aldrich)
for at least 12 h. Prior to usage, the glassware was rinsed thoroughly
with ultrapure water to remove the acid and dried with nitrogen.
Poly(sodium 4-styrenesulfonate) (NaPSS) with an average molecular
weight of 70 kDa (PDI < 1.2, batch no. BCBP3081V) and calcium chloride
dihydrate (purity ≥99%) were purchased both from Sigma-Aldrich
and were used as received. Stock solutions were prepared by dissolving
the powders of NaPSS and CaCl2 in ultrapure water, and
mixtures were prepared by adding the necessary amount of CaCl2 stock solutions to NaPSS. All NaPSS concentrations reported
below refer to the total concentration of monomers. All experiments
were performed at a room temperature of 297 K.
detergent solution (Sigma-Aldrich) and ultrapure water (18.2 MΩ
cm, total oxidizable carbon <5 ppb) and stored in concentrated
sulfuric acid (98% p.a., Carl Roth) with oxidizer NOCHROMIX (Sigma-Aldrich)
for at least 12 h. Prior to usage, the glassware was rinsed thoroughly
with ultrapure water to remove the acid and dried with nitrogen.
Poly(sodium 4-styrenesulfonate) (NaPSS) with an average molecular
weight of 70 kDa (PDI < 1.2, batch no. BCBP3081V) and calcium chloride
dihydrate (purity ≥99%) were purchased both from Sigma-Aldrich
and were used as received. Stock solutions were prepared by dissolving
the powders of NaPSS and CaCl2 in ultrapure water, and
mixtures were prepared by adding the necessary amount of CaCl2 stock solutions to NaPSS. All NaPSS concentrations reported
below refer to the total concentration of monomers. All experiments
were performed at a room temperature of 297 K.
3
SDS-Erythrosine B Langmuir Film Protocol
4
Fabrication of Colloidal Particle Films
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Glass substrates were cleaned in a sulfuric acid (Fisher Scientific) with 1 wt% of NOCHROMIX (Sigma-Aldrich) mixture for 8 h, then rinsed with water and dried under nitrogen gas. Before sample preparation, the glass substrates were cleaned under oxygen plasma. Colloidal films were prepared by drying a particle suspension between two glass substrates. A 200 μm spacer was placed between a glass slide (25 mm × 75 mm × 1 mm) and a coverslip (22 mm × 22 mm) with a 2 mm gap as a sample loading channel. Samples were injected into the channel and the medium was allowed to dry at room temperature. This procedure allows nanoparticles with different sizes to form long-range fcc lattice structures as shown in Supplementary Fig. 7a . Actually, the presence of a finite contact area reduces the distance between nearest particles ( as reported in Supplementary Information), but the effect is very small. The packing fraction can be assumed 75% in all original samples. During the formation of the contiguous films the cluster should shrink.
5
Rigorous Cleaning of Teflon and Glass
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All Teflon and glass ware as well as noble metal wires were stored in sulfuric acid (Merck, Emsure, 98 %) with NOCHROMIX® (Sigma Aldrich) for at least one night. Before each use, the equipment was rinsed with ultra‐pure water (MilliQ Synergy UV, 18.2 MΩ cm at 25 °C, TOC <5 ppb) for 5 times and boiled 3 times in ultra‐pure water for 30 min. Afterwards it was dried under vacuum overnight.
6
Microfluidic Capture of Biotinylated Vesicles
7
Fabrication of Nanostructured Polymer Films
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Silicon oxide wafers were pre-cleaned in a sulfuric acid-NoChromix (purchased from Sigma-Aldrich) overnight and then rinsed with triply distilled water. PS 124 P2VP 61 was dissolved in a 60:40 w/w mixture of THF and toluene (weight fraction of 60:40, respectively) to form a solution with a concentration of 0.8%w/w. Prior to casting the solution was filtered through a 0.22 m PTFE syringe filter. Thin polymer films (~50 nm thickness) were obtained by spin casting the appropriate solutions at 3000 rpm for 40 s onto hydrophilic silicon oxide wafers with 3 nm-thick native oxide. The films were annealed in a closed petri dish under saturated chloroform atmosphere for different time intervals.
The dot pattern was obtained by annealing 50±1 nm-thick of cylindrical PS 124 P2VP 61 films for 9 min. Homopolymers films of PS, P2VP and PS/P2VP blend were prepared; the blend films were obtained after 4 min annealing in chloroform. For the STXM measurements, films were initially cast on KBr pellets, floated on distilled water by dissolving the KBr substrate, and transferred onto silicon nitride membrane windows (Silson Ltd.) by slowly drawing the windows from the solution.
To prepare the ESA templates, films and vials containing 1,4-diiodobutane (DIB) were placed in a specially designed sample holder, inserted into a glass tube oven (Büchi GKR-50) and heated to 75 °C under vacuum for 42 hours.
The dot pattern was obtained by annealing 50±1 nm-thick of cylindrical PS 124 P2VP 61 films for 9 min. Homopolymers films of PS, P2VP and PS/P2VP blend were prepared; the blend films were obtained after 4 min annealing in chloroform. For the STXM measurements, films were initially cast on KBr pellets, floated on distilled water by dissolving the KBr substrate, and transferred onto silicon nitride membrane windows (Silson Ltd.) by slowly drawing the windows from the solution.
To prepare the ESA templates, films and vials containing 1,4-diiodobutane (DIB) were placed in a specially designed sample holder, inserted into a glass tube oven (Büchi GKR-50) and heated to 75 °C under vacuum for 42 hours.
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