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Axis supra xps

Manufactured by Shimadzu

The Axis Supra XPS is a high-performance X-ray photoelectron spectroscopy (XPS) system designed for advanced surface analysis. It provides precise and accurate measurements of the chemical composition and electronic structure of materials at the surface level.

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8 protocols using axis supra xps

1

Surface Imaging of Electrodes via SEM

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To image the surface of electrodes using SEM, experiments were performed under cross-flow, Q = 25 μl/min and Q = 50 μl/min for copper and zinc, respectively, in a constant overlimiting current (J/Jlim = 50) for 15 s. The electrodes were then removed from the microfluidic device manually and washed and dried at room temperature for 24 hours before SEM imaging. The SEM micrographs and EDS analysis were obtained using a Thermo Fisher Quattro S with Kratos Supra Axis XPS. All the experiments were performed at room temperature (21°C).
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2

XPS Characterization of Materials

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XPS measurements
were taken with a Kratos SUPRA Axis XPS, using a monochromated Al
Kα source (1486.6 eV). During all measurements, the chamber’s
base pressure was 2.1 × 10–8 Torr, with a 450
× 900 μm scan size and an emission current of 7 mA.
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3

X-ray Photoelectron Spectroscopy Characterization

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XPS measurements
were taken on a Kratos SUPRA Axis XPS with a monochromated Al Kα
source (1486.6 eV). The chamber’s base pressure was 2 ×
10–8 Torr, with a 7 mA emission current and a scan
size of 450 × 900 μm. Peaks were fitted using Kratos ESCApe;
normalization and Shirley background subtraction were performed after
fitting.
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4

Surface Characterization of Gold-coated Wafers

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Gold-coated silicon wafers were used for ATR-FTIR and XPS analysis for better contact with the analytical equipment; the gold-coated silicon wafer was prepared the same as the gold disc electrodes. ATR–FTIR data collection was conducted with Thermo Nicolet iS10 equipped with air purge with a dew point of −95 °F. Spectra were the results of 128 scans. XPS analyses were performed using Kratos Axis Supra XPS (X-ray Photoelectron Spectroscopy).
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5

Multimodal Analysis of Solid and Waxy Material Properties

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Thermogravimetric analysis (TGA) was applied to determine the water content in the solid and waxy states. Fourier‐transform infrared spectroscopy measurement was conducted by Frontier MIR spectrometer (Shimadzu Trace‐100) with the attenuated total reflectance (ATR) compartment. Small‐wide angle X‐ray scattering was performed by SWAXS Nano‐inXider (Xenocs), where the liquid and gel samples were sealed in borosilicate glass, and the wax and solid samples were by customized Kapton‐sealed holder to prevent water loss under vacuum. X‐ray diffraction (XRD) patterns were obtained by using a Bruker D8 Advance powder diffractometer with Cu‐Kα radiation (λ = 1.5406 Å). SEM study was performed by FESEM 7600F (JEOL) equipped with an Electron back Scattering detector and EDS detector (Oxford). XPS spectra were collected by Kratos AXIS Supra XPS with dual anode (Al/Ag Kα) X‐ray monochromatic source.
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6

Comprehensive Materials Characterization Protocol

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Scanning electron microscopy was performed using Hitachi SEM4800. Thermogravimetry was obtained using universal V4.5A TA instruments. Carbon, Hydrogen, Nitrogen, Sulfur, and Oxygen (CHNSO) elemental analysis was performed by Atlantic Microlabs (Norcross, GA). X‐ray photoemission spectra were obtained with Kratos Axis Supra XPS (X‐ray source: monochromated Al Kα, multichannel plate, and delay line detector with a take‐off angle of 90°). Autosorb iQ was used to measure the surface area of the graphene foam and the cathode electrode.
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7

X-ray Photoelectron Spectroscopy Measurements

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XPS measurements were
performed using a Kratos Axis Supra XPS instrument. Al Kα radiation
was used, and the chamber pressure was less than 5 × 10–8 torr during operation. A charge neutralizer was used for insulating
samples, and the scan resolution was 0.1 eV with a dwell time of 100
ms. CasaXPS was used for data analysis.50 (link) The data was calibrated based on the C 1s peak at 285 eV, and a
Shirley-type background was used.
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8

Comprehensive Material Characterization Protocol

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Scanning electron microscopic (SEM) images were acquired using a Lyra3 GMU FIB SEM (Tescan, Brno, Czech Republic). The Mel and as-prepared PPG were fixed on aluminum stubs with double-sided carbon adhesive tape followed by gold/palladium coating.
Fourier transform infrared (FT-IR) spectra were recorded with attenuated total reflection (ATR) using a Nicolet iS10 FTIR Spectrometer (Thermo Fisher Scientific, Waltham, MA, USA). Spectra were recorded in a wavenumber range of 400–4000 cm−1 with a resolution of 4 cm−1 and 30 scans.
UV-vis absorption spectra were recorded using a SHIMADZU UV-1800 UV spectrophotometer. Spectra were recorded in the wavelength range of 340–900 nm.
Raman spectra were recorded using an AFM-Raman microscope (NTEGRA Spectra, NT-MDT Spectrum Instruments, Moscow, Russia) with a 10 × objective and a 500 nm wavelength laser over a Raman shift range of 200–2000 cm−1. Data from ten separate scans using 1 mW of laser power and 1 min exposure time were averaged to maximizing the signal-to-noise ratio.
X-ray photoelectron spectroscopy was performed using a Kratos Axis Supra XPS. Survey and high-resolution spectra of 1s orbitals of oxygen (O) were obtained using an Al source. The XPS analysis was conducted using the Casa XPS software.
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