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Rtespa 300 probe

Manufactured by Bruker
Sourced in United States

The RTESPA-300 probe is a high-performance nuclear magnetic resonance (NMR) probe designed for Bruker's AVANCE III HD NMR spectrometer. The probe is optimized for routine experiments and sample analysis, providing reliable and consistent results.

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8 protocols using rtespa 300 probe

1

Surface Roughness Analysis by AFM

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The surface nano-roughness (Ra) of the three different surfaces were analyzed by Atomic Force Microscopy (AFM).
The ScanAsyst technique was used for the atomic force microscopy (Bruker) observations with scan size of 10 µm*10 µm and RTESPA-300 probe.
The software Nanoscope was used to analyze images and 3D reconstruction. The roughness average (Ra), that is the arithmetic mean of the absolute values of the height of the surface profile, was considered for the statistical analysis.
Five samples of each group were observed and the mean values (± standard deviation) were considered for the statistical analysis.
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2

Atomic Force Microscopy of E. coli

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AFM images of treated bacterial samples were acquired with a Bruker Innova in dry condition on a ~ 25 mm2 p-type silicon wafer (Sigma-Aldrich). Before depositing bacterial suspension onto the substrate, it was cleaned with a CO2 snow jet while being held on a hot surface at 300 °C. Subsequently, 5 μl of E. coli (106 cfu/ml) suspended in PBS were deposited onto the substrate and allowed to air dry. Before scanning the sample, the substrate was rinsed with deionized water to reduce build-up of salt during dehydration. The images were acquired in tapping mode with a BRUKER RTESPA-300 probe (T: 3.4 μm; L: 125 μm; W: 40 μm; f0: 300 kHz; k: 40 Nm−1).
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3

AFM Imaging of M13 Bacteriophage

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AFM (BRUKER Innova®) images were acquired on a p-type silicon wafer (Sigma-Aldrich®) in dry conditions. A drop of 20 μL containing M13 of 25 μg mL−1 in DIW was drop-cast onto a ∼25 mm2 silicon wafer and let dry at room temperature. The images were subsequently acquired in tapping mode with BRUKER® RTESPA-300 probe (T: 3.4 μm; L: 125 μm; W: 40 μm; f0: 300 kHz; k: 40 N m−1).
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4

Atomic Force Microscopy Analysis of DAE Discs

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Atomic force microscopy (AFM) was used to characterize the average nano-roughness (Ra) of DAE discs (group 3).
The ScanAsyst technique was used for the atomic force microscopy (Bruker) observations with a scan size of 10 µm × 10 µm and a RTESPA-300 probe. The software Nanoscope was used to analyze images and for 3D reconstruction. The roughness average (Ra), which is the arithmetic mean of the absolute values of the height of the surface profile, was considered for the statistical analysis. The AFM observations were performed only in group 3, in order to verify the superficial topography of these discs that were not previously described in the literature. Ten samples were observed, and the mean values (+/− standard deviation) were considered for the statistical analysis.
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5

AFM Analysis of Polymer Film Surface

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The study of the surface structure of polymer films by atomic force microscopy (AFM) was carried out on a MultiMode 8 atomic force microscope (Bruker, Santa Barbara, CA, USA) using an RTESPA-300 probe (Bruker, Santa Barbara, CA, USA). The surface topography of polymer films, as well as their local mechanical properties (Young’s modulus), were studied using the PeakForce QNM method. Sreas of 5 × 5 μm2 were investigated. The films were obtained according to the method described in [26 (link)]; the mass ratio of the components in the CT100-PVP film was 1:1 and 1:2.
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6

Topographic Profiles of GaN Electrodes

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The topographic profiles of the GaN electrodes after their PEC characterizations were measured with an Agilent 5500 Scanning Probe Microscope with a Bruker RTESPA-300 probe.
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7

Imaging RNA Ring Nanoassemblies via AFM

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Imaging was performed with a MultiMode AFM Nanoscope IV system (Bruker Instruments, Santa Barbara, CA, USA) in tapping mode under ambient conditions. The images were recorded at a scanning rate of 1.5 Hz using an RTESPA-300 probe (Bruker Nano Inc., CA, USA) with a resonance frequency of ∼320 kHz and a spring constant of ∼40 N/m. Images were processed using the FemtoScan Online software package (Advanced Technologies Center, Moscow, Russia). Only nonoverlapping ring structures were used for analysis to avoid any influence of possible distortion due to the close proximity of other nanostructures. The cross-sectional tool was used to analyze a distance through the center of a close-up specific ring structure. Two orthogonal cross sections were taken vertically and horizontally to the image orientation. The maximum-to-maximum distance in the cross section was measured, which reports on the distance between segments of nucleic acids in the RNA ring assembly. The deformation factor (DF) was calculated as the ratio of the longer measured distance to the shorter one. The DF was then plotted as a histogram for various designs of the RNA ring nanoassemblies.
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8

Atomic Force Microscopy of Graphene Oxide

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AFM (BRUKER Innova®) images were acquired in dry conditions on a P-type silicon wafer (Sigma-Aldrich®). Before depositing GO and GO-5′ onto the substrate, the latter was modified with (3-aminopropyl) triethoxysilane (APTES) (Sigma-Aldrich®). Then, the silicon was incubated for 30 min in a solution containing acetone and water with a volume ratio of 5 : 1 and 10 mM APTES. 50 Subsequently, two different silicon-APTES wafers were soaked for 3 s in a solution of GO and GO-5′ respectively. Both solutions had a concentration of 1 µg mL -1 . 20 µL of M13 25 µg mL -1 in DIW were drop-cast onto a ∼25 mm 2 silicon wafer and dried at room temperature. The images were acquired in tapping mode with BRUKER® RTESPA-300 probe (T: 3.4 µm; L: 125 µm; W: 40 µm; f 0 : 300 kHz; k: 40 N m -1 ).
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