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U 4100 uv vis nir spectrometer

Manufactured by Hitachi
Sourced in Japan

The U-4100 UV-vis-NIR spectrometer is a laboratory instrument that measures the absorption or transmission of light in the ultraviolet, visible, and near-infrared wavelength ranges. It is designed to analyze the spectral properties of samples, providing data on their chemical composition and structure.

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5 protocols using u 4100 uv vis nir spectrometer

1

Morphological and Crystalline Characterization

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Morphologies and crystallization nature of the products were characterized by SEM (FEI Quanta 200F, 30 kV) and XRD (PANalytical, X'Pert Pro, with Cu Kα radiation). The diffusion reflection spectra were measured in a U4100 UV-vis-NIR spectrometer (Hitachi) equipped with integrating sphere in the wavelength range of 350–800 nm.
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2

Multimodal Spectroscopic Characterization

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1H NMR spectra were obtained on a Bruker Advance 400 spectrometer (Germany). FT-IR spectra were obtained on a TENSOR II FTIR routine spectrometer from Bruker (Germany) after pelleting samples with KBr. The UV-Vis absorption measurement was carried out on a Hitachi U-4100 UV/Vis/NIR spectrometer (Japan). Fluorescence spectra were performed on a FluoroMax-4 high efficiency integrated fluorescence spectrometer (Horiba. United States), and each measurement was repeated three times. The pH of the solution was measured by a Mettler Toledo SevenCompact pH meter S210. Confocal laser scanning microscopy (CLSM) images were recorded on a Leica TCS SP8 lighting confocal microscope (Germany).
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3

Analytical Techniques for Compound Characterization

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1 H NMR (300 or 400 MHz) and 13C NMR (100 MHz) spectra were recorded on a Bruker Avance 300 or 400 spectrometer using CDCl3, DMSO-d6 or D2O as solvent and tetramethylsilane (TMS) as an internal standard. HR-MS spectra were recorded on a Q-TOF6510 spectrograph (Agilent). IR spectra were recorded by use of the IR spectrophotometer VERTEX 70 FT-IR (Bruker Optics). Melting points were measured on an XD-4 digital micro-melting point apparatus. Thin-layer chromatography (TLC) was conducted on silica gel 60F254 plates (Merck KGaA) and column chromatography was conducted over silica gel (mesh 200–300). Fluorescence measurements were conducted on a Perkin-Elmer LS-55 luminescence spectrophotometer, and UV-vis spectra were recorded on a U-4100 UV-Vis-NIR Spectrometer (Hitachi). Quartz cuvettes with a 1 cm path length and 3-mL volume were involved in fluorescence and UV-vis absorption measurements. The pH values were measured by use of a PHS-3C digital pH-meter (YouKe, Shanghai). All reagents were purchased from J&K, Aladdin and Sinopharm Chemical Reagent Co. and used without further purification.
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4

Characterization of PEDOT:PSS-based Films

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Thickness of films on silicon wafers was measured by ellipsometry (Alpha-SE Ellipsometer, J.A. Woollam Co., Inc., Lincoln, NE, USA). UV/vis absorbance of the LbL films on quartz slides was measured using a Hitachi U-4100 UV-vis-NIR spectrometer (Tokyo, Japan). Resistance of films on glass slides was measured on a Keithley 2000 Multimeter (Cleveland, OH, USA). PEDOT:PSS coated glass slides, with and without CH/lignin coatings, were cut in half (ca. 1 × 2 cm2). Contact resistance was reduced by applying silver paint (Electron Microscopy Sciences, Hatfield, PA, USA) on the end of the slide fragments (on both sides), followed by annealing in a Thermofisher TF55030A-1/Blue M Single Segment Tube Furnace (Waltham, MA, USA) under argon at 150 °C for 15 minutes. Films were exposed to ∼250 nm light by being placed immediately under a pair of GERM-3000008 germicidal UV-C light bulbs (1000Bulbs, Garland, TX, USA) attached to a Black-Ray UV Bench Lamp 78 W ballast (UVP, Lipland, CA, USA).
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5

Structural and Optical Characterization of Materials

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TEM images were taken on a Hitachi H-9000NAR instrument operated at 300 kV. Powder X-ray diffraction (XRD) patterns were recorded using a Rigaku MiniFlex X-ray diffractometer (CuKα, Ni filter). Analyses of the surface area and pore structure were carried out using a Quantachrome AUTOSORB-1 automated gas-sorption system with N2 as the adsorbate, after pretreatment of the sample at 200 °C for 2 h under reduced pressure. The BET surface area was calculated from the adsorption branch of the isotherm. Ultraviolet and visible-light diffuse reflection (UV-vis DR) spectra were obtained with a Hitachi U-4100 UV-vis-NIR spectrometer equipped with an integrating sphere using BaSO4 as a reference. The reflectance spectra were converted to absorbance spectra by the Kubelka–Munk method.
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