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Alpha300 ra system

Manufactured by WITec

The Alpha300 RA system is a research-grade atomic force microscope (AFM) designed for high-resolution imaging and analysis of surfaces. The system features a closed-loop scanner, precise vibration isolation, and advanced electronics for accurate and stable measurements. The Alpha300 RA is suitable for a wide range of applications, including materials science, nanotechnology, and biological research.

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3 protocols using alpha300 ra system

1

Nanoscale Visualization of Insulin Complexes

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AFM images were recorded
on a WITec alpha300 RA system. AFM is used for high-resolution nanoscale
surface characterization by recording the interactive forces between
the surface and a sharp cantilever tip. Through AFM, we have monitored
the visual or structural changes in insulin and zinc-bound insulin
and its 1:1 complexes with protamine in the presence of phenol in
10 mM phosphate buffer and 100 mM NaCl buffer. The concentrations
of insulin and ZnSO4 were approximately 80 and 40 μM,
respectively, and phenol was taken in the molar ratio of 1:3 with
respect to insulin. The samples were freshly prepared and drop-cast
on the freshly cleaved mica surface, and a gentle wash was given to
remove the extra salt of buffer for obtaining a clear image. All images
were taken two times to confirm the reproducibility of the results.
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2

Nanoscale Characterization of Quantum Dots

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The XRD pattern
of the powder samples was obtained using a Rigaku Miniflex-600 diffractometer
having a Cu (Kα, λ = 1.5418 Å) source.
TEM images were obtained by a JEOL-2100F electron microscope (operating
voltage 200 KeV) by drop-casting the dispersed sample in toluene on
a carbon-coated copper grid (300 mesh). Raman spectra were obtained
by a Wi-Tec alpha300 RA system having an Ar laser source with wavelength
532 nm. For this measurement, QDs were dispersed in toluene solution
and drop-cast on a glass substrate. EDX analysis was carried out by
SEM, Zeiss EVO40 microscope in which an energy dispersive X-ray analyzer
was attached. UV–vis absorption spectra were observed using
a Hitachi U-3900 UV–vis spectrophotometer. PL and PLE spectra
were obtained by a Hitachi F-4700 fluorescence spectrometer. Fluorescence
decay spectra were acquired by time-correlated single-photon counting
(TCSPC) FL920, Edinburg Instruments, U.K. setup.
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3

Comprehensive Material Characterization Techniques

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The materials were characterized by scanning electron microscopy (SEM) and energy-dispersive X-ray (EDX) spectroscopy using a scanning electron microscope from the company FEI, model Quanta 250 FEG. Structural analysis was performed with Raman spectroscopy using a Witec Alpha 300 RA system equipped with a low power 633 nm wavelength excitation laser to prevent photoluminescence effects and thermal damage in the samples. Finally, the samples were analyzed by X-ray photoelectron spectroscopy (XPS) using a FlexPS system from the company SPECS, equipped with a hemispherical analyzer model PHOBIOS 150 and a detector 1D-DLD, with a monochromatic X-ray source model FOCUS 500 providing Al ka radiation with a characteristic energy of 1486.71 eV.
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