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Helios g4 dualbeam microscope

Manufactured by Thermo Fisher Scientific
Sourced in United States

The Helios G4 DualBeam microscope is a versatile imaging and analysis tool that combines a high-resolution scanning electron microscope (SEM) with a focused ion beam (FIB) system. This instrument allows for detailed observation and characterization of samples at the nanoscale level.

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2 protocols using helios g4 dualbeam microscope

1

Microscopic Characterization of LbL Films

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Optical microscope images of the as-deposited and degraded LbL films on silicon substrates were collected using an Olympus DXS500 microscope (Olympus Deutschland GmbH, Hamburg, Germany) with 10× and 50× magnification lenses. Scanning electron microscopy (SEM) images were collected using a Helios G4 DualBeam microscope (Thermo Fisher Scientific Inc., Waltham, MA, USA) at 1 kV to observe the morphology of the as-deposited and degraded LbL films on silicon substrates without needing any metal sputter-coating.
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2

hBN Metasurface Fabrication and Defect Generation

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hBN metasurfaces are fabricated from exfoliated bulk crystals following the method described in detail in ref. 6 (link). The generation of VB- defects is obtained by irradiating the hBN BIC metasurfaces in a Thermo Fisher Scientific Helios G4 Dual Beam microscope using a 30 kV nitrogen ion beam. The entire region was uniformly irradiated with a fluence of 1.0 ×1014 ions/cm2.
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