Nova 600i dual beam

AFM was performed using Park XE-70 system with ACTA tips. SEM images of LiF, h-BN, and LiF/h-BN on various substrates were captured in an FEI XL30 Sirion SEM. A Woollam M-2000 Spectroscopic Ellipsometer was used for measuring and fitting optical properties and thicknesses of ALD LiF films on Si substrates. TEM characterization was performed at 80 kV using an FEI Titan. After Li plating/stripping cycling, samples were rinsed in 1,3-dioxolane to remove residual electrolyte and salt for SEM imaging. The morphology of plated Li was observed with an FIB (Nova 600i Dual Beam, FEI). The cycled electrodes were cross-sectioned with a Ga⁺ ion beam and observed with the SEM (JSM-6700F, JEOL). XPS was performed on PHI 5000 VersaProbe using an Al Kα (λ = 0.83 nm and hυ = 1486.7 eV) x-ray source operated at 2 kV and 20 mA.

SEM images were captured in a FEI XL30 Sirion SEM. TEM characterization was performed at 300 kV using a FEI Titan TEM. The morphology of plated Li was observed with a FIB (Nova 600i Dual Beam, FEI). The cycled electrodes were cross-sectioned with a Ga⁺ ion beam and observed with the SEM (JSM-6700F, JEOL). X-ray photoelectron spectroscopy (XPS) was performed on PHI 5000 VersaProbe, using an Al Kα (λ = 0.83 nm, hυ = 1486.7 eV) x-ray source operated at 2 kV and 20 mA.