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Tridecafluoro 1 1 2 2 tetrahydrooctyl trichlorosilane

Manufactured by Gelest
Sourced in United States

Tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane is a specialty chemical compound used in various industrial and research applications. It is a fluorinated organosilane with a trichlorosilane functional group. The compound is often used as a coupling agent or surface modifier to impart water-repellent and low-surface energy properties to materials.

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6 protocols using tridecafluoro 1 1 2 2 tetrahydrooctyl trichlorosilane

1

Fabrication of Superhydrophobic Surfaces

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Al-coated PET sheet (#48-5F-1M-13, .005”, CS Hyde Company), ethanol (195 proof, Decon), 2-propanol (Fisher Scientific), N, N-dimethylformamide (Fisher Scientific), Cytop® CTL-109 AE (AGC Chemicals), Fluorinert™ FC-3283 (TMC Industries Inc.), poly(vinyl alcohol) (PVA, average Mw ~125,000, Sigma-Aldrich), poly(vinylidene fluoride) (PVDF, average Mw ~534,000, Sigma-Aldrich), P800, P400 and P220 sandpaper sheets (3M Co.), SiO2 nanoparticles (NPs) with different sizes (Nissan Chemicals), (tridecafluoro-1,1,2,2-tetrahydrooctyl) trichlorosilane (SIT8174.0, Gelest Inc.), NeverWet Multi-Surface (Rust Oleum), Polyester paper (0.008”, Durilla Synthetics), PET sheet (0.006”, eMigoo) are purchased and used as received.
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2

Synthesis of Siloxane-Based Biomaterials

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(7.0 to 8.0% vinylmethylsiloxane)-dimethylsiloxane copolymer (VDT-731), platinum-divinyltetramethyl-disiloxane complex (Pt catalyst; SIP6831.2LC), (25 to 35% methylhydrosiloxane)-dimethylsiloxane copolymer (HMS-301), and (tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane (SIT8174.0) were purchased from Gelest Inc. (USA). 2,4,6,8-Tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane, glycerol, sebacic acid, acetone, and IPA were obtained from Sigma-Aldrich Inc. (USA). All reagents were used as received without further purification.
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3

Soft Lithography-based Microfluidic Device Fabrication

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Devices were fabricated using standard soft lithography (Xia and Whitesides, 1998 (link); Xia, 2008 (link)). Silicon-wafer masters were created by exposing a layer of SU-8 2025 resist (Microchem, Newton, MA) through a transparency mask and developing the master in a bath of glycol monomethyl ether acetate (PGMEA). CAD files for the Y-chip and the imaging chip are provided in Supplemental CAD file 2 and 3. Masters were treated with tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane (Gelest, Morrisville, Pennsylvania) vapor to facilitate release. Devices were formed by casting polydimethylsiloxane pre-polymer (PDMS Sylgard 184, Dow Corning, Corning, NY) against masters. After curing and mold release, holes for external connections (fluidic inlets and outlets, worm injection, and electrodes) were formed using a 1.5 diameter punch. Devices were exposed to an air plasma then bonded to glass slides (Y-chip) or coverslips (calcium imaging chip).
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4

Silanization of Acrylic Microfluidic Components

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Once both components were fabricated, their acrylic faces were silanized to produce a fluorophilic and hydrophobic surface, using a modification of a gas-phase silanization procedure designed for glass.29 (link),30 First, both components were treated with air plasma for 1 min. A 300 μL aliquot of tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane (Gelest Inc., Morrisville PA, USA) was placed into a small polypropylene dish in a vacuum desiccator, followed immediately by the two components, and a vacuum was applied for 2 hours. Each component was thoroughly rinsed with water and ethanol and dried with nitrogen. Next, the hydrophobic silane was removed from inside the ports and chamber of the chamber component by plasma treatment for 1 min, while the acrylic face was protected by a clean piece of thin PDMS (SSP, Ballston Spa NY, USA).
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5

Surface Silanization of 3D Printed Parts

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Where noted, some printed parts were plasma treated using a BD-20AC laboratory corona treater (Electro-Technic Products, Chicago IL, USA). Printed parts were placed 3 mm below the plasma source and treated for 5 – 60 s immediately prior to surface silanization. For gas-phase deposition, 200 μL of neat tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane (Gelest Inc., Morrisville PA, USA) was placed in a vacuum desiccator in a small polypropylene dish, followed immediately by the printed parts, and a vacuum was applied for 2 hours at room temperature. For solvent deposition, the surface of the printed part was submerged in a 10% v/v solution of tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane in solvent (Fluorinert FC-40 (Sigma Aldrich) or 200 proof ethanol (Koptec) for 30 min at room temperature, unless otherwise specified. After silanization, surfaces were rinsed with 95% ethanol and DI water and dried with a nitrogen gun.
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6

Fabrication of Hydrophobic Surfaces

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Nitric acid, hydrogen peroxide and hydrofluoric acid were obtained from VWR (Radnor, PA). Sodium hydroxide and ethanol were obtained from Sigma Aldrich (St. Louis, MO). (Tridecafluoro-1,1,2,2-tetrahydrooctyl) trichlorosilane was obtained from Gelest (Morrisville, PA). For all solutions, ultrapure deionized water was used (Barnstead International, Inc., Dubuque, IA).
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