Model rtesp

Example 12

Atomic Force Microscopy (AFM) Characterization of Graphene Flakes.

For graphene flake characterization, a sample of graphene/EC dispersion in ethanol was deposited onto Si/SiO₂ for AFM characterization. Prior to sample deposition, Si/SiO₂ wafers were immersed in 2.5 mM 3-aminopropyl triethoxysilane (Aldrich, 99%) in 2-propanol (Macron Chemicals, 99.5%) for 30 minutes, after which they were rinsed with 2-propanol and blown dry under a stream of N₂. A diluted graphene dispersion was dropcast onto the wafers and left for 10 minutes, after which it was blown dry with N₂ and rinsed with 2-propanol. To remove ethyl cellulose and residual 3-aminopropyl triethoxysilane, the samples were annealed at 400° C. in a tube furnace for 30 minutes. AFM images were obtained using a Bruker ICON PT AFM System in tapping mode with a Veeco Model RTESP (MPP-11100-10) cantilever. The images were collected with 2 μm×2 μm scans, and particle characteristics were determined using Nanoscope Analysis software. Flake thickness was determined from line scans, and flake area was measured automatically using the software. Flake thickness was measured for 355 flakes, and flake area was measured for 216 flakes. (See FIGS. 9A-C.)

Example 12

Atomic Force Microscopy (AFM) Characterization of Graphene Flakes.

For graphene flake characterization, a sample of graphene/EC dispersion in ethanol was deposited onto Si/SiO₂ for AFM characterization. Prior to sample deposition, Si/SiO₂ wafers were immersed in 2.5 mM 3-aminopropyl triethoxysilane (Aldrich, 99%) in 2-propanol (Macron Chemicals, 99.5%) for 30 minutes, after which they were rinsed with 2-propanol and blown dry under a stream of N₂. A diluted graphene dispersion was dropcast onto the wafers and left for 10 minutes, after which it was blown dry with N₂ and rinsed with 2-propanol. To remove ethyl cellulose and residual 3-aminopropyl triethoxysilane, the samples were annealed at 400° C. in a tube furnace for 30 minutes. AFM images were obtained using a Bruker ICON PT AFM System in tapping mode with a Veeco Model RTESP (MPP-11100-10) cantilever. The images were collected with 2 μm×2 μm scans, and particle characteristics were determined using Nanoscope Analysis software. Flake thickness was determined from line scans, and flake area was measured automatically using the software. Flake thickness was measured for 355 flakes, and flake area was measured for 216 flakes. (See FIGS. 9A-C.)

Example 12

Atomic Force Microscopy (AFM) Characterization of Graphene Flakes.

For graphene flake characterization, a sample of graphene/EC dispersion in ethanol was deposited onto Si/SiO₂ for AFM characterization. Prior to sample deposition, Si/SiO₂ wafers were immersed in 2.5 mM 3-aminopropyl triethoxysilane (Aldrich, 99%) in 2-propanol (Macron Chemicals, 99.5%) for 30 minutes, after which they were rinsed with 2-propanol and blown dry under a stream of N₂. A diluted graphene dispersion was dropcast onto the wafers and left for 10 minutes, after which it was blown dry with N₂ and rinsed with 2-propanol. To remove ethyl cellulose and residual 3-aminopropyl triethoxysilane, the samples were annealed at 400° C. in a tube furnace for 30 minutes. AFM images were obtained using a Bruker ICON PT AFM System in tapping mode with a Veeco Model RTESP (MPP-11100-10) cantilever. The images were collected with 2 μm×2 μm scans, and particle characteristics were determined using Nanoscope Analysis software. Flake thickness was determined from line scans, and flake area was measured automatically using the software. Flake thickness was measured for 355 flakes, and flake area was measured for 216 flakes. (See FIGS. 9A-C.)