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Isopropyl alcohol c3h8o

Manufactured by Merck Group
Sourced in United States

Isopropyl alcohol (C3H8O) is a clear, colorless liquid chemical compound. It is a type of alcohol commonly used as a solvent, disinfectant, and cleaning agent in various laboratory and industrial applications.

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7 protocols using isopropyl alcohol c3h8o

1

Nb-Sn Anode Material Electrochemical Characterization

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Nb (niobium powder, <45 µm, 99.7% metal basis), Sn (<125 µm, 99.8% metal), graphite powder (<30 µm), isopropyl alcohol (C3H8O), potassium hydroxide (KOH), acetylene black, and Nafion solution (binder) were purchased from Sigma Aldrich. The electrochemical characterizations were performed with three-electrode assembly, in which an Ag/AgCl electrode was used as the reference electrode, a platinum-wire electrode (purchased from Top Sky Technology China, Shenzhen, China) was used as an auxiliary electrode, and nickel foam on which the prepared sample was deposited was used as the working electrode. A mixture of distilled water (DI) and ethanol was used for the preparation of the solution and the cleaning of electrode materials throughout the experiment.
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2

Synthesis of Titanium-Zinc Oxide Nanocomposites

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All reagents were of analytical grade and were applied in this study without further purification: titanium (IV) isopropoxide (Ti(OC3H7)4, Sigma Aldrich, St. Louis, MO, USA, 98.0%), zinc acetate ((CH3CO2)2Zn, Sigma Aldrich, St. Louis, MO, USA, 99.99%), isopropyl alcohol (C3H8O, Sigma Aldrich, St. Louis, MO, USA, ≥99.5%), hydrochloric acid (HCl, Sigma Aldrich, St. Louis, MO, USA, 37.0%), sodium hydroxide (NaOH, Sigma Aldrich, St. Louis, MO, USA, ≥85.0%), potassium cyanide (KCN, Sigma Aldrich, St. Louis, MO, USA, ≥97.0%), picric acid ((O2N)3C6H2OH, Sigma Aldrich, St. Louis, MO, USA, ≥99.0%), sodium carbonate (Na2CO3, Sigma Aldrich, St. Louis, MO, USA, ≥99.0%), hydrogen peroxide (H2O2, Sigma Aldrich, St. Louis, MO, USA, 35%), silver nitrate (AgNO3, Sigma Aldrich, St. Louis, MO, USA, >99.8%), nitric acid (HNO3, Sigma Aldrich, St. Louis, MO, USA, 69%), sodium metasilicate nonahydrate (Na2O3Si·9H2O, Sigma Aldrich, St. Louis, MO, USA, ≥98.0%), sodium aluminate (Sigma Aldrich, St. Louis, MO, USA, ≥98.0%), Al(Al2O3): 50–56%, Na(as Na2O): 37–45%).
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3

Synthesis and Characterization of Titanium-Zinc Oxide Nanocomposites

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All chemicals (analytical grade) were utilized in this research without additional purification: titanium (IV) isopropoxide (Ti(OC3H7)4, Sigma Aldrich, St. Louis, MO, USA, 98.0%), zinc acetate ((CH3CO2)2Zn, Sigma Aldrich, 99.99%), isopropyl alcohol (C3H8O, Sigma Aldrich, ≥99.5%), hydrochloric acid (HCl, Sigma Aldrich, 37.0%), sodium hydroxide (NaOH, Sigma Aldrich, ≥85.0%), hydrogen peroxide (H2O2, Sigma Aldrich, 35%), sodium metasilicate nonahydrate (Na2O3Si·9H2O, Sigma Aldrich, ≥98.0%), kaolin (Sigma Aldrich), sodium dodecyl sulfate (CH3(CH2)11OSO3Na, Sigma Aldrich, ≥99.0%), poly(ethylene glycol) (H(OCH2CH2)nOH, Sigma Aldrich).
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4

Synthesis and Characterization of Copper-based Nanomaterials

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All reagents were purchased from commercial sources and used without further purification: Trithiocyanuric acid [C3H3N3S3] (Sigma-Aldrich, St. Louis, MO, USA, 95.0%), Copper(II) perchlorate hexahydrate [Cu(ClO4)2·6H2O] (Sigma-Aldrich, St. Louis, MO, USA, 98.0%), N,N-Dimethylformamide [(CH3)2-N-CHO] (Fisher Scientific, Waltham, MA, USA, 99.9%), Isopropyl alcohol [C3H8O] (Sigma Aldrich, St. Louis, MO, USA, ≥99.5%), Titanium(IV) isopropoxide [Ti(OC3H7)4] (Sigma Aldrich, St. Louis, MO, USA, 98%), Acetic acid [CH3COOH] (Fluka, 99,8%), Hydrogen chloride [HCl] (Fisher Scientific, Waltham, MA, USA, 37%), Cetyl-trimethyl ammonium chloride [C19H42NCl] (Sigma Aldrich, St. Louis, MO, USA, 25%), Hydrogen peroxide [H2O2] (Sigma Aldrich, St. Louis, MO, USA, 35%), Silver nitrate [AgNO3] (Sigma Aldrich, St. Louis, MO, USA, >99.8%), Nitric acid [HNO3] (Sigma Aldrich, St. Louis, MO, USA, 69%), Zinc acetate dihydrate [Zn(CH3COO)2·2H2O] (ACS, St. Louis, MO, USA, ≥98%), Methylene blue [C16H18ClN3S·xH2O] (Sigma Aldrich, St. Louis, MO, USA, ≥95%). Computational calculations were achieved using the Vienna Ab initio Simulation Package (VASP) version 6.0 (VASP Software GmbH, Vienna, Austria) and Gaussian version 09 (Gaussian, Inc., Wallingford, CT, USA) software packages.
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5

Silicon Etching Using TMAH and IPA

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Tetramethylammonium hydroxide (C4H13NO) 25 wt % in water and isopropyl alcohol (C3H8O) were purchased from Sigma-Aldrich. The silicon layers with no oxide layer were removed using 25 wt % TMAH saturated with IPA (10, 20, and 30 vol %) at 65 ºC for 30 s. Then, the masking layers were removed using diluted hydrofluoric acid with deionized water (1:100) for 10 s to obtain the final structure (Figure 15). The experiment was also repeated for different etching times with constant IPA concentration (10 vol %) and temperature (65 °C) in order to study the relationships of the etching depth and width, etching rate and surface roughness.
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6

Synthesis and Characterization of Metal-Oxide Materials

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The following reagents (analytical grade) were used in this study without further purification: isopropyl alcohol (C3H8O, Sigma Aldrich, St. Louis, MO, USA, ≥99.5%), titanium (IV) isopropoxide (Ti(OC3H7)4, Sigma Aldrich, St. Louis, MO, USA, 98.0%), acetic acid (CH3COOH, Sigma Aldrich, St. Louis, MO, USA, 99.8%), zinc acetate dihydrate (Zn(CH3COO)2∙2H2O, ACS, St. Louis, MO, USA, ≥98.0%), lanthanum nitrate hexahydrate (La(NO3)3∙6H2O, Sigma Aldrich, St. Louis, MO, USA, 99.9%), cerium(III) nitrate hexahydrate (Ce(NO3)3∙6H2O, Sigma Aldrich, St. Louis, MO, USA, 99.9%), potassium cyanide KCN, Sigma Aldrich, St. Louis, MO, USA, ≥97.0%), sodium hydroxide (NaOH, Sigma Aldrich, St. Louis, MO, USA, ≥85.0%), picric acid ((O2N)3C6H2OH, Sigma Aldrich, St. Louis, MO, USA, ≥99.0%), sodium carbonate (Na2CO3, Sigma Aldrich, St. Louis, MO, USA, ≥99.0%).
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7

Synthesis and Characterization of Ammonium Tetrathiotungstate

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ATT ((NH4)2WS4) was prepared according to the method described by Ramanathan (Ramanathan & Weller, 1985) (link). Ammonium metatungstate ((NH4)6H2W12O40x18H2O; Sigma-Aldrich) (15.0 g, 5.1 mmol) is dissolved in 75.0 mL of distilled water containing 52.5 mL of an ammonium hydroxide solution (NH4OH (20%); Sigma-Aldrich). The resulting ammonia solution was heated in a temperature bath to 60 ᵒC for 6 h, while hydrogen sulfide was bubbled (H2S (g)) into the solution. The reaction mixture was then cooled in an ice bath and allowed to stand for 12 h, yielding yellow crystals. The product was vacuum-filtered, washed with isopropyl alcohol (C3H8O; Sigma-Aldrich) stored under N2 atmosphere at 15 ᵒC and it was named as ATT. The molecular structure of ATT is shown in Fig. 1a. UV-Vis λmax (nm): 216, 276, 393. FTIR (cm -1 ): 460 (ν Mo-S); 3128, 1395 (ν N-H). 1 H-NMR (CDCl3):  7.14 (s, 8H, (NH4)2).
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