The largest database of trusted experimental protocols

Sem evo ma 10

Manufactured by Zeiss
Sourced in Italy, Germany, United States

The SEM EVO|MA 10 is a scanning electron microscope (SEM) designed and manufactured by Zeiss. As an SEM, its core function is to magnify and image the surface of solid samples by scanning them with a focused beam of electrons. The SEM EVO|MA 10 provides high-resolution imaging capabilities for a wide range of applications.

Automatically generated - may contain errors

3 protocols using sem evo ma 10

1

Scanning Electron Microscopy of Hair Fibers

Check if the same lab product or an alternative is used in the 5 most similar protocols
The cross-section of the prepared HFs was observed using a scanning electron microscope (SEM EVO|MA 10, Zeiss, Milano, Italy). The HFs were fractured in liquid nitrogen and then sputter-coated with gold. Sample images were acquired in high-vacuum mode, working at 20 kV.
+ Open protocol
+ Expand
2

Characterization of PVA-Collagen-HA Composite Membrane

Check if the same lab product or an alternative is used in the 5 most similar protocols
Each group was cut with a size of 5 × 5 mm. The surface of the PVA–collagen–HA composite membrane was coated with 10-nm-thick gold using a sputter coater (Quorum Q150R ES, Quorum, East Sussex, UK) and observed using a scanning electron microscope (SEM) (SEM EVO MA 10, ZEISS, Jena, Germany) at an accelerating voltage of 16 kV. The photo taken is the membrane surface with ×1,000 and ×5,000 magnification. The interpretation results of SEM were analyzed using ImageJ software.
+ Open protocol
+ Expand
3

Quantifying Bone Ingrowth via SEM Imaging

Check if the same lab product or an alternative is used in the 5 most similar protocols
Unstained polished sections of the resin-embedded implants were imaged using backscattered scanning electron microscopy (SEM-EVO MA10, Zeiss, White Plains, NY, USA) equipped with Oxford Aztec (Zeiss, USA). To increase the conductivity of the materials and, consequently, image quality, copper SEM tape was attached to each sample and to the stub prior to the imaging and samples were sputter coated with a layer of gold palladium (Polaron e500) (Quorum Technologies, Laughton, UK). SEM parameters chosen for imaging were electron high tension (EHT) 20.00 kV, magnification 26–30× and, I probe 600 pas. Images were analyzed for new bone formation (%) using ImageJ v. 1.8.0 (NIH, Madison, WI, USA). A circular region (ROI), corresponding to the defect area, was initially cropped. Then, both the total area of the defect and the area of the new bone were binarized using an interactive threshold method (default). Thresholding enabled the isolation and quantification of bone formation based on greyscale. The percentage of new bone formation was determined according to the following formula: A boneA tot×100
where, A bone represents the area (in pixels) of the new bone ingrowth and A tot is the total area of interest.
+ Open protocol
+ Expand

About PubCompare

Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.

We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.

However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.

Ready to get started?

Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required

Sign up now

Revolutionizing how scientists
search and build protocols!