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Joel 2100

Manufactured by JEOL
Sourced in Japan

The JEOL-2100 is a transmission electron microscope (TEM) designed for high-resolution imaging and analysis of materials at the nanoscale. It features a LaB6 electron source and advanced optics to provide a stable and high-brightness electron beam. The JEOL-2100 is capable of delivering a resolution of 0.25 nm and supports a wide range of analytical techniques, including electron diffraction, energy-dispersive X-ray spectroscopy (EDS), and electron energy-loss spectroscopy (EELS).

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2 protocols using joel 2100

1

Comprehensive Materials Characterization Protocol

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Transmission electron microscopy (TEM) was carried out using JOEL-2100, Tokyo, Japan at 200 kV. Scanning electron microscopic (SEM) analysis was performed using JSM 6510LV (JEOL, Tokyo, Japan). UV spectra of synthesized ZnO-NPs were taken by using UV–vis spectrophotometer-UV5704S from Electronics, India Ltd. X-ray diffraction (XRD) was performed using Mini Flex™ II XRD system, Rigaku Corporation, Tokyo, Japan. Fourier-transform infra-red spectroscopy (FTIR) analysis was performed on PerkinElmer FTIR spectrometer Spectrum Two (Perkin Elmer Life and Analytical Sciences, Shelton, CT, USA).
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2

Multimodal Characterization of Materials

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Specific surface area and pore size distribution of samples, was calculated using the BET method from N2 adsorption/desorption isotherms obtained using a static volumetric adsorption analyzer (Micromeritics ASAP 2010, Shanghai, China). Morphology and microstructure of the as-prepared samples was determined via a scanning electron microscope (SEM; S4800, Hitachi, Japan) and high-resolution transmission electron microscope (HR-TEM; Joel-2100, JEOL, Japan). Crystal structures were analyzed by X-ray diffraction (XRD, RIGAKU miniflex/600, Japan) in the range between 20° and 80°. Thermogravimetric analysis was conducted on a TGA Q5000 (American TA instrument Q Series) to better understand phase transformations during calcination. Optical properties of samples, were examined using a Cary 500 UV–vis NIR spectrophotometer in the range 200–800 nm. The chemical states of elements at the near surface of samples were also studied using X-ray photoelectron spectroscopy (XPS, Phi 5000C ESCA system, USA).
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