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Xeuss 2.0 saxs system

Manufactured by Xenocs
Sourced in France

The Xeuss 2.0 SAXS system is a laboratory instrument designed for small-angle X-ray scattering (SAXS) analysis. It is capable of providing detailed structural information about materials at the nanometer scale.

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2 protocols using xeuss 2.0 saxs system

1

SAXS Analysis of GM Filaments

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GM solution was extruded through a 1 mm tube into DMF and left for 30 s to obtain a filament. Three positions from the edge to the center of this filament were selected for study. Experiments were conducted on Xeuss 2.0 SAXS system (Xenocs, France) with a Pilatus 300K (Dectris) detector using Cu Kα radiation (50 kV, 60 mA) and an exposure time of 10 min. The sample‐detector distance was 294 mm, which was calibrated using silver behenate. 1D scattering profiles were reduced from the 2D data using Foxtrot.
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2

Structural Characterization of Crystalline Domains

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The wide-angle X-ray scattering (WAXS) measurements were performed at Xeuss 2.0 SAXS System (Xenocs, France) with an X ray of 0.154189 nm, operated at 50 kV and current 0.6 mA. The distance from the sample to the detector was 88 mm, and the exposure time was set as 300 s. The in situ small-angle X-ray scattering (SAXS) measurements were carried out at BL19U2 (Shanghai Synchrotron Radiation Facility) with an X ray of 0.1033 nm. The distance from the sample to the detector was 2721.76 mm, and the exposure time was set as 10 s. SasView software was adopted to fit the SAXS results to estimate the average distance between adjacent crystalline domains (Dac) and the average size of crystalline domains (Dc).
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