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4 protocols using γ methacryloxypropyl trimethoxysilane mps

1

Synthesis and Characterization of Dental Composite Materials

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The following components were obtained from Sigma-Aldrich (St. Louis, MO): 2-hydroxyethyl methacrylate (HEMA), triethylene glycol dimethacrylate (TEGDMA), methacrylic acid (MA), camphoroquinone (CQ), ethyl-4-(dimethylamino) benzoate (EDMAB), diphenyliodonium hexafluorophosphate (DPIHP), mono(2-methacryloyloxy)ethyl succinate (MMES), dodecyltrichlorosilane, chlorhexidine digluconate (CHX), N,N-Dimethylformamide (DMF), dichloromethane (DCM), and N-methyl morpholine (NMM). γ-methacryloxypropyl trimethoxysilane (MPS) was used as received from MP Biomedicals (Solon, OH). Rink amide resin, Fmoc-amino acid building blocks and 2-(1H-benzotriazole-1-yl)-1,1,3,3-tetramethyluranium hexafluorophosphate (HBTU) were purchased from AAPPTec LLC (Louisville, KY). All chemicals were used as received without further purification.
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2

Synthesis and Characterization of Dental Composite Materials

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The following components were obtained from Sigma-Aldrich (St. Louis, MO): 2-hydroxyethyl methacrylate (HEMA), triethylene glycol dimethacrylate (TEGDMA), methacrylic acid (MA), camphoroquinone (CQ), ethyl-4-(dimethylamino) benzoate (EDMAB), diphenyliodonium hexafluorophosphate (DPIHP), mono(2-methacryloyloxy)ethyl succinate (MMES), dodecyltrichlorosilane, chlorhexidine digluconate (CHX), N,N-Dimethylformamide (DMF), dichloromethane (DCM), and N-methyl morpholine (NMM). γ-methacryloxypropyl trimethoxysilane (MPS) was used as received from MP Biomedicals (Solon, OH). Rink amide resin, Fmoc-amino acid building blocks and 2-(1H-benzotriazole-1-yl)-1,1,3,3-tetramethyluranium hexafluorophosphate (HBTU) were purchased from AAPPTec LLC (Louisville, KY). All chemicals were used as received without further purification.
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3

Dental Adhesive Monomer Synthesis and Characterization

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2,2-Bis[4-(2-hydroxy-3-methacryloxypropoxy) phenyl]propane (BisGMA) and 2-hydroxyethyl methacrylate (HEMA) were obtained from Sigma-Aldrich (St. Louis, MO) and used as received without further purification as monomers in dental adhesives. γ-methacryloxypropyltrimethoxysilane (MPS) was used as received from MP Biomedicals, Santa Ana, CA. Camphoroquinone (CQ), ethyl-4-(dimethylamino) benzoate (EDMAB), and lactic acid (LA) were obtained from Sigma-Aldrich (St. Louis, MO). p-octyloxy-phenylphenyl iodonium hexafluoroantimonate (OPPIH) was purchased from Gelest Inc., (Morrisville, PA). All other chemicals were reagent grade and used without further purification.
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4

Photoreactive Dental Resin Formulation

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The following formulation components were obtained from Sigma-Aldrich (St. Louis, MO, USA): Bisphenol A glycerolate dimethacrylate (BisGMA), 2-hydroxyethyl methacrylate (HEMA), camphoroquinone (CQ), ethyl-4-(dimethylamino) benzoate (EDMAB), and diphenyliodonium hexafluorophosphate (DPIHP). The formulation components γ-methacryloxypropyl trimethoxysilane (MPS) and methacryloxyethoxytrimethylsilane (MES, 95%) were obtained from MP Biomedicals (Solon, OH, USA) and Gelest Inc. (Morrisville, PA, USA), respectively. The chemicals were used as received without further purification. Scheme 1 provides the chemical structures of the components in the formulations.
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