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Jem 4010

Manufactured by JEOL
Sourced in Japan

The JEM-4010 is a transmission electron microscope (TEM) manufactured by JEOL. It is designed to provide high-resolution imaging and analysis of materials at the atomic scale. The JEM-4010 is capable of operating at accelerating voltages up to 400 kV, allowing for detailed examination of a wide range of specimens.

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9 protocols using jem 4010

1

Structural Characterization of MoS2 Films

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The structural characterisation of the MoS2 films was performed by using HR-TEM for the cross-sectional view (Jeol, JEM-2100F (200 kV) and plan view (Jeol, JEM-4010 (400 kV)). A focused ion beam (FEI) was used to form a cross-sectional TEM sample of the MoS2 film after the EBI process for 1 min. We used a hole-filled carbon grid to prepare a plan-view TEM sample. In addition, Raman spectroscopy (WITec, alpha 300 S) with 532 nm laser and AFM (WITec, alpha 300 S) were used to check the lattice vibration and surface topography, respectively. Raman spectra were measured by using a × 100 objective lens and 1800 grooves/mm grating. The wavelength resolution of the spectrometer was 1.4 cm−1. The chemical state and stoichiometry of MoS2 films were characterised by XPS (Ulvac-PHI, PHI 5000 VersaProbe) with an Al Kα X-ray and pass energy of 23.5 eV for analysis.
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2

Characterization of Mesoporous Cu-doped FeSn-G-SiO2 Nanocomposite

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In this study, the phase structure and purity of the mesoporous Cu-doped FeSn–G–SiO2 (CFSGS) nanocomposite were investigated by X-ray diffraction (XRD; Rigaku, Japan) with Cu-Kα radiation (λ = 1.5406 Å) at 40 kV and 30 mA across a 2θ range of (20–70)°. Scanning electron microscopy (SEM) was used to examine the morphologies of the samples that were acquired. EDS analysis was performed by SEM (JSM-76710F, JEOL, Japan), transmission electron microscopy (TEM) (JEM-4010, JEOL, Japan), and high-resolution TEM (HRTEM) (JSM-76710F, JEOL, Japan), operating at an accelerating voltage of 300 kV. X-ray photoelectron spectroscopy (XPS), Diffuse Reflectance Spectroscopy (DRS), and Raman spectroscopy (RAMAN) analyses were performed utilizing WI Tec. alpha 300 series. Porous characterization of CFSGS structure was performed with a full analysis of N2 adsorption/desorption tests (BELSORP-max, BEL Japan Inc.). Electrochemical measurements were made by PGP201 Potentiostat (A41A009), Volta lab™, Denmark.
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3

Transmission Electron Microscopy Imaging

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Particles were adsorbed
from aqueous suspensions to carbon film Cu
TEM grids for 15 min. After the removal of the liquid with Kimwipe
paper, grids were washed with a drop of Milli-Q water to remove residual
salt precipitates. Standard imaging was performed on a Zeiss EM 912
Omega at an acceleration voltage (U) of 120 kV. High-resolution
imaging was performed on (i) a Jeol JEM 4010 transmission electron
microscope (U = 400 kV) and on (ii) an FEI Titan
80/300 scanning transmission electron microscope (U = 300 kV) equipped with a probe corrector, an EDX detector, and
an EELS spectrometer.
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4

Comprehensive Characterization of Synthesized Products

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The phase structure
and purity of the as-synthesized products were
examined by X-ray diffraction (XRD; Rigaku, X-ray Diffractometer)
with Cu Kα radiation (λ = 1.5406 Å) at 40 kV, 30
mA over the 2θ range 20–70°. Morphologies were studied
utilizing scanning electron microscopy (SEM) and energy-dispersive
X-ray spectroscopy (EDS) analysis by utilizing SEM (JSM-76710F, JEOL,
Tokyo, Japan), transmission electron microscopy (TEM) (JEM-4010, JEOL,
Tokyo, Japan), and high-resolution TEM (HRTEM) (JSM-76710F, JEOL,
Tokyo, Japan) operating at a 300 kV accelerating voltage. X-ray photoelectron
spectroscopy (XPS), differential reflectance spectroscopy (DRS), and
Raman spectroscopy (RAMAN) analyses were performed utilizing WI Tec.
alpha300 series. Porous characterizations of ZAG and ZAGS structures
were obtained with a full analysis of N2 adsorption–desorption
tests (BELSORP-max, BEL Japan Inc.). (PG201, Potentiostat, Galvanostat,
VoltaLab, Radiometer, Denmark.)
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5

Comprehensive Material Characterization Techniques

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A JEOL JSM-6700F (Tokyo, Japan) scanning electron microscope was employed for the observation of the sample morphologies. The structures of the samples were observed using a high-resolution transmission electron microscope (JEOL JEM-4010, Tokyo, Japan) equipped with an energy-dispersive spectral analyzer. Prior to analysis, the powdered samples were dispersed in absolute ethanol by ultrasonication for 10 minutes in a KQ-250B ultrasonic bath. The samples were then placed on a copper grid; the sample-coated grid was dried in a vacuum oven. The X-ray diffraction (XRD) measurements of the samples were carried out with a Rigaku X-ray diffractometer with Cu Kα radiation (λ=1.5418 Å) at an operating voltage of 40 keV and 20 mA and a scan rate of 2°/min. The binding energy plots of the samples were obtained with an X-ray photoelectron spectrophotometer (K-alpha, Thermo VG, Cambridge, UK) using a monochromated Al X-ray source (Al Kα line: 1,486.6 eV).
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6

Characterization of Synthesized Nanomaterials

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We examined the
phase structure and purity of as-synthesized products by X-ray diffraction
(XRD; Rigaku, X-ray diffractometer) with Cu Kα radiation (λ
= 1.5406 Å) at 40 kV, 30 mA over 2θ units for 20–70°.
We investigated the morphologies of the obtained samples using field-emission
scanning electron microscopy and EDS (energy-dispersive X-ray spectroscopy)
analysis provided by an SEM (scanning electron microscope) (JSM-76710F,
JEOL, Tokyo, Japan), a transmission electron microscope (TEM) (JEM-4010,
JEOL, Tokyo, Japan), and a high-resolution TEM (HRTEM) (JSM-76710F,
JEOL, Tokyo, Japan) operated at a 300 kV accelerating voltage. We
did X-ray photoelectron spectroscopy (XPS), diffuse reflectance spectroscopy
(DRS), and Raman spectroscopy (RAMAN) analyses by using WI Tec Alpha
300 series.
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7

Characterization of Silica-Coated Magnetic Nanoparticles

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The particle size and morphology of silica-coated magnetic nanoparticles were determined by transmission electronic microscopy (TEM) using a JEM-4010 (JEOL; Tokyo, Japan) at an accelerating voltage of 400 kV. The magnetic nanoparticles and silica-coated magnetic nanoparticles were characterized by powder X-ray diffraction (XRD), using a Rigaku D/MAX-2500 diffractometer (Rigaku; Tokyo Japan) using filtered Cu Kα radiation, and the data were collected for 2θ of 20.0° to 80.0°. The magnetization of silica-coated magnetic nanoparticles at room temperature up to 10 kOe was measured by vibrating sample magnetometer (VSM) using a VSM 4179 (Oxford Instruments; Oxfordshire, UK). Fourier transform infrared (FT-IR) spectroscopy was used to identify the functionalized MNPs@SiO2. The FT-IR spectra were recorded on a V-460 (JASCO; Easton, MD, USA) FT-IR spectrometer using KBr pellets. Spectra were obtained at a resolution of 4 cm-1, and the wavenumber range from 4,000 to 650 cm-1. The fluorescence intensity and absorbance of the samples were measured using microplate reader Infinite M200 (Tecan Ltd). The fluorescence was measured five times for each sample with a 20-μs integration time.
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8

Comprehensive Structural Analysis of Samples

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The morphological characteristics and structures of the samples were studied using a scanning electron microscope (SEM, JEOL JSM-6700F) equipped with an energy-dispersive X-ray spectroscopy (EDX) and a high-resolution transmission electron microscope (HRTEM, JEOL JEM-4010). The XRD measurements were carried out with a Rigaku X-ray diffractometer with Cu Kα radiation (λ = 1.5418 Å) at a scan rate of 2º/min at an operating voltage of 40 keV and 20 mA. X-ray photoelectron spectroscopy (XPS, K-alpha, Thermo VG, U.K.) employing a monochromated Al X-ray source (Al Kα line: 1486.6 eV) was used to obtain the binding energy plots of the samples.
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9

Characterization of Thermoelectric Composites

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X-ray diffraction analysis of the bulk composite samples was analyzed using Rigaku D/MAX-2500/PC with Cu Kα radiation. The microstructure of the composites was examined by using a high-resolution transmission electron microscope (HRTEM, JEM- 4010, JEOL) and scanning electron microscopy (SEM, Verios 460 L, FEI). Rectangular sample (2 × 2 × 9 mm3) were cut for the estimation of electrical conductivity and Seebeck coefficient, which were measured by using a four-point probe (TPMS, ZEM-3). High temperature charge transport performance were measured up to 730 K by using a high-temperature Hall measurement (HT-Hall, Toyo Corporation, ResiTest 8400). A circular disc specimen of 1 mm in thickness and 10 mm in diameter was used for thermal diffusivity measurement using a laser flash method (DLF-1300, TA instrument). The density was measured by Archimedes-principle. Thermal conductivity (κ) was calculated from the relation, diffusivity (α) × density (ρ) × specific heat capacity (Cp).
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