Sigma field emission sem fesem
The Zeiss Sigma field emission SEM (FESEM) is a scanning electron microscope that utilizes a field emission electron source to generate a high-resolution electron beam. The FESEM is designed for high-magnification imaging and analysis of a wide range of samples, providing detailed information about the surface topography and composition of materials at the nanoscale level.
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2 protocols using sigma field emission sem fesem
Scanning Electron Microscopy of BMDCs
Scanning Electron Microscopy of Bone Marrow Dendritic Cells
Scanning Electron Microscopy (SEM): BMDC were isolated as described above, and grown on fibronectin-coated glass slides for 24 hours, were fixed overnight in 4% paraformaldehyde with 2% glutaraldehyde in 0.1 M sodium cacodylate buffer (pH 7.4). The slides were gently washed twice with the same buffer, and then post-fixed in 1% aqueous osmium tetroxide (OsO4) for one hour. Samples were then washed twice in purified water and dehydrated in an increasing ethanol series (50%, 70%, 80%, 90%, 100%, 100%, 5 min each). Finally, the specimens were critical-point dried (CPD) in liquid CO2, in a Tousimis 815B critical-point dryer (Tousimis, MD). CPD-dried samples were mounted on SEM stubs with adhesive copper tape and sputter-coated with 4 nm of Au/Pd film (4 nm in thickness) in a Denton Desk II machine (Denton Vacuum, NJ). The prepared SEM samples were examined with a Zeiss Sigma field emission SEM (FESEM) (Carl Zeiss Microscopy, NY) operated at 2-3 kV, using InLens SE detection.
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