Jamp 9500f

AES was performed using a JEOL JAMP-9500F field emission scanning Auger microprobe (JEOL Ltd., Tokyo, Japan). Briefly, this instrument probes chemical bonds by irradiating a surface locally with a focused electron beam, and measuring the energetic spectrum of electrons emitted through the Auger effect. These secondary electrons with relatively low energy primarily originate from a 2–3 nm layer at the surface. Scanning this beam with a small irradiation spot size allows the acquisition of hyperspectral images with a sub-micron spatial resolution. In conjunction, the instrument can be operated in scanning electron microscopy (SEM) mode, for comparing the morphological appearance of the sample.
Cells incubated with HMDS and Infacol and cells cultured on PDMS dishes were compared to non-incubated cells as negative controls. Areas with around 20–200 cells were divided into fields of 256 × 256 pixels which were scanned in the narrow bands for gold (Au_MNN, 2015 eV), silicon (Si_LMM 92 eV), carbon (C_KLL 263 eV) and nitrogen (N_KLL 375 eV) with a dwell time of 100 ms per pixel. Narrow band signals were integrated and background subtracted in Spectra Inspection Software (JEOL). The resulting bitmaps were converted to binary images and diluted in ImageJ. Across every row of Fig. 1c, the images were treated with the same threshold settings.

Functionalized Cu–O surfaces were characterized by X-ray photoelectron spectroscopy (XPS) using a Jeol JAMP 9500F (Jeol Ltd., Tokyo, Japan) equipped with a non-monochromatic Al K_α X-ray source (energy 1486.6 eV, Specs GmbH, Berlin, Germany). Due to sample dimension limitations of the XPS, Si coupons of approximately 8 × 8 mm² were coated with identical Cu–O thin films and functionalized alongside the Cu–O coated steel disks for equivalent ML formation and molecular coverage. Powder of the C18PA reactant pressed into an indium foil was analyzed as well. X-ray photoelectron spectra were recorded utilizing 20 eV pass energy of the detector, step sizes of 0.25 eV for a survey and 0.05 eV for detailed spectra with 5 and 20 recording cycles, respectively. The energy calibration of the hemispherical analyzer was performed by using Au 4f_7/5 (83.98 eV), Ag 3d_5/2 (368.26 eV), and Cu 2p_3/2 (932.67 eV) signals. Charging was compensated by the adventitious C 1s signal (285.0 eV) [39 (link)]. Spectra analysis was carried out with the CasaXPS software (Version 2.3.19, Casa Software Ltd., Teignmouth, UK) applying mixed Gaussian–Lorentz signals and Shirley backgrounds for signal deconvolution as well as sensitivity factors determined by Wagner et al. [40 (link)] for surface chemistry calculations.

An Auger electron spectrometer (JAMP-9500F, JEOL) was used to perform Auger electron spectrometry (AES) measurements and depth direction analysis of the sample surface. Measurement conditions were primary electron beam: 10 keV, 2.0 × 10⁻⁸ A; beam diameter: 30 m; sputtering conditions were Ar, 3.0 keV, 30 nm/min (SiO₂ conversion).

A volumetric sorption analyzer (Autosorb-iQ, Anton Paar QuantaTec Inc, Boynton Beach, FL, USA) was used to determine the specific surface area, pore size distribution, and total pore volume of the ACFs by N₂ isothermal adsorption (77 K). The samples were degassed for 2 h at 350 °C. The non-local density functional theory (NLDFT) and the Brunauer–Emmett–Teller (BET) method were used to compute the pore size distribution (PSD) and the specific surface area S_BET [22 (link),23 (link)]. At a relative pressure of 0.99, the total pore volume V_tot was estimated to be equal to the liquid volume of the adsorbate (N₂).
An Ultim Max 100 EDX detector (Oxford Instruments, Abington, United Kingdom) coupled to a scanning Auger electron spectroscopy microscope (JAMP-9500F, JEOL Ltd., Akishima, Japan) was used to characterize structural and elemental properties of the samples. Energy-dispersive X-ray spectroscopy (EDX) measurements were performed at an acceleration voltage of 5 kV. The system was also used to take scanning electron microscopy (SEM) images.

SEM PSi cross sections were acquired soon after the samples preparation (to avoid surface oxidation and the need to coat the sample with conductive layer) on a Jeol JMS 7401F SEM (Tokyo, Japan) at either 5 kV or 10 kV of beam energy.
Auger (AES) measurements were performed at room temperature with a JEOL Ltd. JAMP-9500F (Tokyo, Japan) field emission scanning Auger microprobe system. AES line profiles were acquired with a primary beam of 10 keV. The take-off angle of the instrument was 0°. For Auger elemental analysis, an 8 nm probe diameter was used. Elemental images were acquired with a primary beam of 10 keV. The take-off angle of the instrument was 0°.