Vhx 600

A profilometer (Dektak 150, Veeco) was used for measuring each printed layer. Microscopy images were taken by scanning electron microscopy combined with a focused ion beam (FIB-SEM; Nova Nanolab 200, FEI), TEM (JEM-2100F, JEOL), AFM (XE-100, Park System), and optical microscopy (VHX-600, Keyence). The crystallographic and elemental structures were analyzed via XRD (X’Pert PRO Alpha-1, Malvern Panalytical) and XPS (K-Alpha XPS, Thermo Fisher). All mechanical tests were performed using a digital force gauge (M5-5, Mark-10) fixed on a motorized test stand (ESM303, Mark-10).

The detailed morphological structures of the anther, fresh, and dehydrated
pollens were examined under a 3D microscope (Keyence VHX-600), and their sizes
were recorded.

Additionally, another way was used to assess the microleakage in the specimens, by calculating the percentage of the microleakage depending on the dye penetration distance. The specimens were evaluated using a digital microscope (VHX 600, Keyence, Osaka, Japan), at 30x magnification power. An image analysis software was used to assess the leak by measuring the extent of the penetration of the dye which was calculated by measuring the distance from the external surface to the spot where no dye can be detected in μm. To comply with the areas that are included in the scores, a total of 400 μm of the distance was examined from the external edge to the pulp floor, and each 100 μm was correlated with the corresponding score in which that distance is included. This was done to facilitate the comparisons of the results obtained from both techniques. The percentage of the microleakage was calculated by the following formula:
$\begin{array}{c}\text{Microleakage}\%=\frac{\text{Linear\hspace{0.17em}distance\hspace{0.17em}of\hspace{0.17em}penetration\hspace{0.17em}of\hspace{0.17em}the\hspace{0.17em}dye}}{\text{Total\hspace{0.17em}linear\hspace{0.17em}distance\hspace{0.17em}from\hspace{0.17em}the\hspace{0.17em}external\hspace{0.17em}margin\hspace{0.17em}to\hspace{0.17em}the\hspace{0.17em}pulp\hspace{0.17em}floor}}\times 100.\end{array}$

The spherulites of PLLA at T_c were observed using a digital microscope (VHX-600, KEYENCE Corp., Japan) equipped with a temperature-controlled stage (LTS350, Linkam Scientific Instruments Ltd., UK). POM observation was conducted in a crossed Nicols optical system with a sensitive color plate.

The morphological
analysis of the Cu mesh, Cu foam, and Cu film samples was performed
with a Zeiss Gemini 450 instrument equipped with an InLens/secondary
electron and a backscattered electron detector. For the InLens and
backscattered electron detection modes, accelerating voltages (electron
currents) of 3.0 kV (100 pA) and 20 kV (1.5 nA) were used as standard
settings. AZtec 4.2 software (Oxford Instruments) was applied to acquire
energy-dispersive X-ray point spectra and the respective 2D elemental
mappings. Surface analysis of the blanket wafer coupons (reference
samples) was conducted by tapping mode AFM (Nanosurf Easy Scan II).
The surface characterization of the Cu foams deposited on a RDE was
further carried out using a 3D digital microscope with focus variation
(VHX600, Keyence).

The morphology of the PVP layer adsorbed on the AgNWs was investigated by optical microscope (VHX-600, Keyence), scanning electron microscope (SEM, SU8020, Hitachi High-Technologies), and transmission electron microscope (TEM, JEM-2100, JEOL). The sheet resistance of 30 mm × 20 mm AgNW electrodes was measured using a four-point probe meter (Loresta GP T610, Mitsubishi Chemical Analytech). The transmittance investigated here was the transmittance of parallel light and does not include the transmittance of diffused light. The parallel transmittance (T_p) of the AgNW electrode for wavelengths in the range 300–900 nm was measured using a UV–visible/near-infrared spectrophotometer (V670, JASCO). The testing window size of the spectrophotometer is 12 mm × 6 mm, and three different places of one sample were tested and the average value was used as the transmittance for each sample. Thermogravimetry analysis (TGA) was carried out on a thermal analyzer (TG–DTA 2000SA, Netzsch Japan). The electrode haze was measured using a D65 illumination haze meter with a strong visible light source (HZ-V3, Suga Test Instruments). For the capacitive sensor, changes in capacitance were measured using a digital multimeter (34410A, Agilent Technologies).

A Zeiss Gemini 1530 (Zeiss Oberkochem; Germany) was applied for capturing high-resolution SEM (scanning electron microscope) images. For the lower magnifications, an ESEM (environmental scanning electron microscope) with an ESEM XL-30 microscope (Philips, Eindhoven; Netherlands) was used. Samples for electron microscopic SEM/ESEM analyses were fixed in 2% [v/v] aqueous glutaraldehyde fixative and finally treated with osmium oxide. Then, the specimens were processed through acetone dehydration steps and subjected to critical point drying at 43 °C. The TEM (transmission electron microscope) analyses were performed with a TemCam-F416 (4 K × 4 K) CCD camera (TVIPS, Gauting; Germany) hooked to a Tecnai 12 transmission electron microscope (FEI, Eindhoven; The Netherlands), by using an accelerating voltage of 120 kV.
A digital light microscope VHX-600 (Keyence, Neu-Isenburg; Germany) with a VH-Z25 zoom lens was applied for light microscopic inspections.