Acylic acid

Methyl methacrylate (MMA), toluene, p-toluenesulfonic acid, cis-1,2-cyclohexanedicarboxylic anhydride (HHPA), acylic acid (AA), methacrylic acid (MAA), butyl acrylate (BA), n-butyl methacrylate (BMA), styrene (St), hydroxyethyl methacrylate (HEMA), 1-dodecanethiol, ammonium persulfate (APS), ammoniumhydroxide (NH₃·H₂O), N,N-dimethylethanolamine (DMEA), were provided by Sinopharm Chemical Reagent Co., Ltd. (SCRC, Shanghai, China). Reactive emulsifier SE-10 was purchased from Foshan Kodi Gas Chemical Industry Co., Ltd (Foshan, China). Poly(ethylene buthlene glycol adipate) ester were provided by Zhongshan Daoqum Co., Ltd (Zhongshan, China), the molecular weight of Poly(ethylene buthlene glycol adipate) ester was 1000. Dimethylolpropionic acid (DMPA) was purchased from Shanghai Aladdin Co., Ltd (Shanghai, China). In order to eliminate the inhibitor, the activated carbon adsorption method and alkali washing with NaOH or NaHCO₃ was used for the water-soluble monomer (AA, MAA, HEMA) and other monomer (BA, BMA, St), respectively. Other materials were used without further purification.

Acylic acid (AA), methacrylic acid (MAA), butyl acrylate (BA), n-butyl methacrylate (BMA), styrene (St), hydroxyethyl methacrylate (HEMA), 1-dodecanethiol, ammonium persulfate (APS), trimethylamine (TEA), ammoniumhydroxide (NH₃∙H₂O), sodium dodecyl sulfonate (SDS), dodecanethiol, N,N-dimethylethanolamine (DMEA), 1,4-Butylene glycol (BDO), butanedioic acid and Alkylphenolpolyoxyethylene ether (OP-10) were provided by Sinopharm Chemical Reagent Co., Ltd. (SCRC, Shanghai, China). Reactive emulsifier SE-10 was purchased from Foshan Kodi Gas Chemical Industry Co., Ltd (Foshan, China). Isophoronediisocyanate (IPDI), polycarbonate diol (PCDL, the type of polycarbonate diol was 1,5-pentanediol and 1,6-hexanediol) were provided by Zhongshan Daoqum Co., Ltd. (Zhongshan, China). Dimethylolpropionic acid (DMPA) was purchased from Shanghai Aladdin Co., Ltd. (Shanghai, China). Dibutyltindilaurate (DBTDL) was purchased from Beijing Sananhua Co., Ltd. (Beijing, China). In order to eliminate the inhibitor, the activated carbon adsorption method and alkali washing with NaOH or NaHCO₃ were used for the water-soluble monomer (AA, MAA, HEMA) and other monomer (BA, BMA, St), respectively. Other materials were used without further purification.