prepared on glass substrates (no. 1.5, Marienfeld-Superio, Lauda-Königshofen,
Germany), used for fluorescence microscopy imaging, and on silicon
wafers coated with 5 μm SiO2 (Silicon Materials,
Kaufering, Germany), used for reflectometric interference spectroscopy
(RIfS). Both substrates were treated for 20 min with a H2O/NH3/H2O2 (5:1:1, v/v) solution
at 70 °C and subsequently activated for 30 s with O2-plasma (Zepto LF PC, Diener electronic, Ebhausen, Germany). The
hydrophilized substrates were mounted in a measuring chamber and immediately
incubated with SUVs.
For the preparations on glass slides, SLBs
were formed by incubating the substrates for 1 h with SUVs (m = 0.2 mg, c = 0.53 mg/mL) at 20 °C
and excess lipid material was removed by a 10-fold buffer exchange
with spreading buffer followed by ezrin buffer (50 mM KCl, 20 mM Tris,
0.1 mM NaN3, 0.1 mM EDTA, pH 7.4). For SLB formation on
silicon substrates, SUVs (m = 0.2 mg, c = 0.53 mg/mL) were spread while the optical thickness was read out.
After successful SLB formation, excess lipid material was removed
by rinsing 5 min with spreading buffer and 5 min with ezrin buffer.