An e-beam evaporation system (Anelva L-400EK) was used to deposit the Al nanofilm (10 nm thick at 0.5 Å/s) on GCF through a shadow mask to avoid depositing Al on suspending CNTs. The thickness was measured in situ by using a quartz crystal sensor, which was calibrated by using an atomic force microscope (AFM; Veeco Dimension V). According to Tavernarakis et al. (40 (link)), if CNT is decorated by metal nanoparticles, it might be visible in an optical microscope. However, the CNT suspension thread of the torsion balance is invisible in optical microscope. There might be some Al deposition on the part adjacent to GCF, but the other parts of suspended CNT are free of Al deposition according to the scanning electron microscopy (SEM) images.
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Selective Al Deposition on Graphene Cantilever Film
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Corresponding Organization : Nanjing University of Aeronautics and Astronautics
Other organizations : Beihang University
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Variable analysis
independent variables
- Deposition method: e-beam evaporation
- Thickness of Al nanofilm: 10 nm
- Deposition rate: 0.5 Å/s
- Visibility of CNT suspension thread in optical microscope
- Presence of Al deposition on suspended CNT parts adjacent to GCF
- Deposition of Al on GCF through a shadow mask to avoid depositing on suspending CNTs
- Thickness measurement using a quartz crystal sensor calibrated by AFM
- Positive control: Not explicitly mentioned.
- Negative control: Not explicitly mentioned.
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