Electroplating Optimization for BMEP Impedance
Corresponding Organization : Drexel University
Variable analysis
- Electroplating technique (gold solution and multi-walled carbon nanotubes vs. platinum nanograss coating)
- Impedance levels of BMEP recording channels
- Impedance levels of BMEP reference channel
- Wire diameter (9.6 μm and 12.7 μm)
- Initial impedance range of BMEP recording channels (2–4 MΩ for 9.6 μm wire, 2–3 MΩ for 12.7 μm wire)
- Target impedance levels (200 kΩ for recording channels, 50 kΩ for reference channel)
- Positive control: Not mentioned
- Negative control: Not mentioned
Annotations
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