The pre-polymer solution for tPIN particle preparation included a mixture of the following: 20% v/v Poly(ethylene glycol) diacrylate (PEG-DA, Sigma-Aldrich, Mn = 700), 40% v/v Poly(ethylene glycol) (PEG, Sigma-Aldrich, Mn = 600), 35% v/v nanoparticles with 2% low melting agarose and 200uM free DNA as a reverse primer and 5% v/v Darocur 1173 (Sigma-Aldrich). The free reverse primer was captured in 2% low melting agarose. The free reverse primer dose not react in RT process because the nanocapsules inhibit RT non-specific binding product28 (link). The solution for the tPIN was finalized by mixing the pre-polymer solution and 1 mM acrydited DNA as a forward primer with a volume ratio of 9:1. The tPINs were produced by dropping the pre-polymer solution on the PDMS, which was pre-patterned with eight different dot codes using a jetting system (Arrayer 2000, Advanced Technology Inc., Korea)20 (link). (Figure S1) The solution then underwent 10 sec of UV exposure at 4.5 mJ/cm2. The preparation of the tPINs was completed through a rinsing process using 1 × PBS buffer of 0.05% Tween-20 to remove the porogens and the unbound primers. The completed particles were stored at room temperature soaked in a 1 × PBS buffer with 0.05% Tween-20.
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