Synthesis of tPIN Particles with DNA
Corresponding Organization :
Other organizations : Korea Institute of Science and Technology, Korea University
Variable analysis
- Proportion of components in the pre-polymer solution (20% v/v Poly(ethylene glycol) diacrylate (PEG-DA), 40% v/v Poly(ethylene glycol) (PEG), 35% v/v nanoparticles with 2% low melting agarose and 200uM free DNA as a reverse primer, 5% v/v Darocur 1173)
- Presence of 1 mM acrydited DNA as a forward primer in the final tPIN solution
- UV exposure time (10 sec) and intensity (4.5 mJ/cm2) during tPIN production
- Production of tPIN particles
- PDMS substrate with pre-patterned dot codes
- Rinsing process using 1 × PBS buffer of 0.05% Tween-20 to remove porogens and unbound primers
- Storage conditions for completed tPIN particles (room temperature, soaked in 1 × PBS buffer with 0.05% Tween-20)
- None specified
- None specified
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