Passivation of Silica Substrates for TIRF Microscopy
Corresponding Organization :
Other organizations : University of Regensburg, Center for NanoScience, Ludwig-Maximilians-Universität München, Institute of Cancer Research, University of Bristol
Variable analysis
- Cleaning method (peroxomosulfuric acid treatment)
- Silane passivation (N-[3-(Trimethoxysilyl)-propyl]ethyldiamine solution)
- PEG passivation (methoxy-PEG succinimidyl valerate 5000 and biotin-PEG in NaHCO3)
- Not explicitly mentioned
- Fused silica slides (Plano)
- Millipore water
- Methanol
- Acetic acid
- Incubation times and temperatures
- Sonication
- Positive control: Not mentioned
- Negative control: Not mentioned
Annotations
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