] To fabricate a mold of the devices, a SU‐8 negative photoresist (MicroChem, Round Rock, TX), was sequentially patterned using photolithography on a silicon wafer. A mixture of base and curing agent of Sylgard 184 A/B polydimethyl‐siloxane (PDMS) (Dow Corning, Midland, MI) was poured onto the SU‐8 mold to replicate the microstructures. The cured PDMS replica was removed from the mold, and holes were created for fluid reservoirs. Plastic chambers for medium reservoirs were fabricated with a computer‐controlled Zing laser cutter (Epilog Laser, Golden, CO) with a 6 mm thick acrylic plate. The replicated PDMS and plastic layers were glued together using PDMS. The resultant assembly was irreversibly bonded to a customized glass‐bottomed uni‐well plate (MatTek, Ashland, MA) by oxygen plasma treatment (Plasma Etch, Carson City, NV). In prior to the cell culture on the device, each chamber was coated with 1% (v/v) Matrigel matrix (Dow Corning) diluted in DMEM/F‐12 (Life Technologies, Grand Island, NY) for 1 h and washed it with Dulbecco's phosphate‐buffered saline (DPBS, Lonza, Hopkinton, MA) thoroughly.
Fabrication of Chemotactic Brain-on-a-Chip Model
] To fabricate a mold of the devices, a SU‐8 negative photoresist (MicroChem, Round Rock, TX), was sequentially patterned using photolithography on a silicon wafer. A mixture of base and curing agent of Sylgard 184 A/B polydimethyl‐siloxane (PDMS) (Dow Corning, Midland, MI) was poured onto the SU‐8 mold to replicate the microstructures. The cured PDMS replica was removed from the mold, and holes were created for fluid reservoirs. Plastic chambers for medium reservoirs were fabricated with a computer‐controlled Zing laser cutter (Epilog Laser, Golden, CO) with a 6 mm thick acrylic plate. The replicated PDMS and plastic layers were glued together using PDMS. The resultant assembly was irreversibly bonded to a customized glass‐bottomed uni‐well plate (MatTek, Ashland, MA) by oxygen plasma treatment (Plasma Etch, Carson City, NV). In prior to the cell culture on the device, each chamber was coated with 1% (v/v) Matrigel matrix (Dow Corning) diluted in DMEM/F‐12 (Life Technologies, Grand Island, NY) for 1 h and washed it with Dulbecco's phosphate‐buffered saline (DPBS, Lonza, Hopkinton, MA) thoroughly.
Corresponding Organization : Sungkyunkwan University
Other organizations : Korea Institute of Brain Science, Korea Institute of Science and Technology, Institute for Neurodegenerative Disorders, University of California, San Francisco, University of California, Irvine, Korea University of Science and Technology, Institute for Basic Science, Samsung (South Korea)
Variable analysis
- Fabrication of a mold of the devices using SU-8 negative photoresist and photolithography on a silicon wafer
- Replication of the microstructures by pouring a mixture of base and curing agent of Sylgard 184 A/B polydimethylsiloxane (PDMS) onto the SU-8 mold
- Creation of holes for fluid reservoirs in the cured PDMS replica
- Fabrication of plastic chambers for medium reservoirs using a computer-controlled laser cutter
- Bonding of the replicated PDMS and plastic layers using PDMS
- Irreversible bonding of the assembled device to a customized glass-bottomed uni-well plate using oxygen plasma treatment
- The ability of the fabricated device to be used as a model for Alzheimer's disease (AD) brain
- Coating of each chamber with 1% (v/v) Matrigel matrix diluted in DMEM/F-12 for 1 hour prior to cell culture
- Thorough washing of the coated chambers with Dulbecco's phosphate-buffered saline (DPBS)
- No positive or negative controls were explicitly mentioned in the provided information.
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