The chemotactic chip was employed to create AD brain models. Details of the chip design were described in the previous study.[36 (link)
] To fabricate a mold of the devices, a SU‐8 negative photoresist (MicroChem, Round Rock, TX), was sequentially patterned using photolithography on a silicon wafer. A mixture of base and curing agent of Sylgard 184 A/B polydimethyl‐siloxane (PDMS) (Dow Corning, Midland, MI) was poured onto the SU‐8 mold to replicate the microstructures. The cured PDMS replica was removed from the mold, and holes were created for fluid reservoirs. Plastic chambers for medium reservoirs were fabricated with a computer‐controlled Zing laser cutter (Epilog Laser, Golden, CO) with a 6 mm thick acrylic plate. The replicated PDMS and plastic layers were glued together using PDMS. The resultant assembly was irreversibly bonded to a customized glass‐bottomed uni‐well plate (MatTek, Ashland, MA) by oxygen plasma treatment (Plasma Etch, Carson City, NV). In prior to the cell culture on the device, each chamber was coated with 1% (v/v) Matrigel matrix (Dow Corning) diluted in DMEM/F‐12 (Life Technologies, Grand Island, NY) for 1 h and washed it with Dulbecco's phosphate‐buffered saline (DPBS, Lonza, Hopkinton, MA) thoroughly.
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