Facile CuI Thin Film Fabrication
Corresponding Organization : Sungkyunkwan University
Other organizations : Chung-Ang University
Variable analysis
- Dopant type (thiourea, N-methylthiourea, N-ethylthiourea, N-propylthiourea, N-isopropylthiourea, N-butylthiourea, N-tertiarybutylthiourea, N,N'-dimethylthiourea, potassium ethylxanthogenate, 1,2-ethanedithiol)
- Dopant concentration (0.5-10%)
- Not explicitly mentioned
- Concentration of pristine CuI solution (0.144 M)
- Solvents used (acetonitrile, dimethylsulfoxide)
- Purity of reagents (99.999% CuI, 99.8% acetonitrile, 99.9% dimethylsulfoxide, 99.99% thiourea, 97% N-methylthiourea, 99% N-ethylthiourea, 98% N-propylthiourea, 98% N-isopropylthiourea, 96% potassium ethylxanthogenate, ≥98.0% 1,2-ethanedithiol)
- None specified
- None specified
Annotations
Based on most similar protocols
As authors may omit details in methods from publication, our AI will look for missing critical information across the 5 most similar protocols.
About PubCompare
Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.
We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.
However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.
Ready to get started?
Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required
Revolutionizing how scientists
search and build protocols!