of 99.997% purity (metals basis) from Alfa Aesar was mixed with HPLC
LC-MS grade ultrapure water from VWR. For saturation with CO2, the K2CO3 aqueous electrolytes were purged
with the gas for ∼30 min. A Si wafer (n-type doping, electric
resistivity ∼15 ± 3 MΩ cm) with a 50 nm Au thin
film on top of a 70 nm Ti film was obtained from MicroFabSolutions;
the wafer chip size was ∼12 × 12 mm2. A polished
Au polycrystal of 1.7 mm thickness was supplied by Surface Preparation
Laboratory. A monodisperse 757 ± 19 nm polystyrene sphere suspension
of 5%/wt was obtained from MicroParticles GmbH.