Thermal Stability of MEHA and DT SAMs
Corresponding Organization : Hanyang University
Other organizations : Korea University, Tokyo Institute of Technology
Variable analysis
- Annealing temperature (733 K)
- Annealing duration (4 h)
- Immersion time in MEHA solution (1 min, 10 min, 1 h)
- Annealing temperature for thermal stability comparison (373 K)
- Annealing duration for thermal stability comparison (1 h)
- Formation of MEHA SAMs on Au(111) substrate
- Thermal stability of MEHA SAMs compared to DT SAMs on Au(111)
- Quenching in N2-bubbled ethanol (EtOH) solvent after annealing
- Concentration of MEHA and DT solutions (0.01 mM)
- Solvent used for SAM deposition (EtOH)
- Room temperature (RT) for SAM deposition
- Pre-covered DT SAMs on Au(111) for thermal stability comparison
- None specified
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