Fabrication of Striated Substrate Using Soft Lithography
Corresponding Organization : Wake Forest University
Other organizations : Virginia Tech - Wake Forest University School of Biomedical Engineering & Sciences
Variable analysis
- Preparation of the striated substrate using soft lithography and micromoulding techniques
- Characteristics of the striated substrate, such as ridge width (7.3 μm), ridge height (6 μm), and gap width (6 μm)
- PDMS (polydimethylsiloxane) stamp (negative (inverted) relief structure of the striated substrate)
- Norland Optical Adhesive-81 (NOA-81) used to create the striated substrate
- 365 nm UV light used to cure the NOA-81
- 60 mm × 24 mm, #1.5 microscope cover slide used as the substrate
- Not explicitly mentioned
- Not explicitly mentioned
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