Polydimethylsiloxane (PDMS) stamps for microcontact printing consisting of an array of 20 μm wide, 200 μm long rectangles were fabricated according to published methods.21 -23 (link) Briefly, glass wafers were spincoated with SPR 220.3 positive photoresist (Microchem), exposed to UV light through a transparency-based photomask and developed using MF-319 developer (Microchem). Sylgard 2184 PDMS (Dow Corning) was then mixed in a 10:1 base to curing agent ratio, mixed and degassed and then poured on the patterned photoresist and cured at 65°C for 4 hours. PDMS were then cut out and sonicated in a 50% ethanol solution for 45 minutes and dried under a stream of nitrogen.
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Fabrication of PDMS Microcontact Stamps
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Corresponding Organization : Carnegie Mellon University
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Variable analysis
independent variables
- Fabrication of PDMS stamps with an array of 20 μm wide, 200 μm long rectangles
- Not explicitly mentioned
- Glass wafers
- SPR 220.3 positive photoresist (Microchem)
- MF-319 developer (Microchem)
- Sylgard 2184 PDMS (Dow Corning) mixed in 10:1 base to curing agent ratio
- Curing of PDMS at 65°C for 4 hours
- Sonication of PDMS in 50% ethanol solution for 45 minutes
- Drying of PDMS under a stream of nitrogen
- Positive control: Not specified
- Negative control: Not specified
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