GO was characterized by Fourier transform infrared in attenuated total internal reflectance mode (ATR-FTIR) (Perkin-Elmer, Waltham, MA, US); X-ray photoelectron spectra (XPS) (Specs, Berlin, Germany) with a PHOIBOS 150 1D-DLD analyzer (PHOIBOS, Kowloon, Hong Kong, China), using a monochromatic source of Al-Kα (1486.7 eV, 13 kV, 100 W), C1s spectrum from GO was analyzed, and dynamic light scattering (DLS) in a Zetasizer Nano ZS DLS (Malvern Panalytical, JarmanWay, Royston, UK).
Synthesis and Characterization of Graphene Oxide
GO was characterized by Fourier transform infrared in attenuated total internal reflectance mode (ATR-FTIR) (Perkin-Elmer, Waltham, MA, US); X-ray photoelectron spectra (XPS) (Specs, Berlin, Germany) with a PHOIBOS 150 1D-DLD analyzer (PHOIBOS, Kowloon, Hong Kong, China), using a monochromatic source of Al-Kα (1486.7 eV, 13 kV, 100 W), C1s spectrum from GO was analyzed, and dynamic light scattering (DLS) in a Zetasizer Nano ZS DLS (Malvern Panalytical, JarmanWay, Royston, UK).
Corresponding Organization : University of Atlántico
Other organizations : Universidad de San Buenaventura, Bogota, University of Teramo
Protocol cited in 1 other protocol
Variable analysis
- Amount of graphite used (3.0 g)
- Duration of oxidation with KMnO4 (three days)
- Purification of graphene oxide (GO) by dialysis and lyophilization
- Characterization of GO by ATR-FTIR, XPS, and DLS
- Centrifugation process
- Use of Milli Q water
- Dialysis tube (Thermo Scientific, Suwanee, GA, US)
- Lyophilization conditions (-51 °C and 0.12 mBar, Labconco, Kansas City, MO, US)
- ATR-FTIR (Perkin-Elmer, Waltham, MA, US)
- XPS (Specs, Berlin, Germany) with a PHOIBOS 150 1D-DLD analyzer (PHOIBOS, Kowloon, Hong Kong, China), using a monochromatic source of Al-Kα (1486.7 eV, 13 kV, 100 W)
- DLS in a Zetasizer Nano ZS DLS (Malvern Panalytical, JarmanWay, Royston, UK)
- Not explicitly mentioned
- Not explicitly mentioned
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